New materials and new processes for MEMS applications

J. Å Schweitz*, K. Larsson, G. Thornell, H. Björkman, F. Nikolajeff

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review


    The field of 'non-silicon MEMS' is today rapidly expanding. The reasons are numerous: silicon has a limited functionality in many MEMS applications; the toolbox for micromachining of non-silicon materials is steadily growing in size and versatility; the price level of a variety of other advanced materials for MEMS has become more competitive etc. This development is here illustrated by a number of examples from a wide variety of materials classes, methods for synthesis and microprocessing, and fields of application. Among these examples are high-aspect ratio processing of different materials by ion track technology (MITE) and deep ion projection lithography (DIPL); laser microprocessing and free-space 3D laser writing; high-precision 3D diamond replicas from microstructured silicon masters; and microreplication in polymeric materials for microoptics and microsystems technology.

    Original languageEnglish
    Pages (from-to)57-72
    Number of pages16
    JournalMaterials Research Society Symposium - Proceedings
    Publication statusPublished - 2000


    Dive into the research topics of 'New materials and new processes for MEMS applications'. Together they form a unique fingerprint.

    Cite this