Abstract
Future CMOS will require the placement of dopants in a predetermined location, namely, a single atom control. Deterministic doping method, i.e. single-ion implantation, realizes ordered arrays of single-atoms in silicon, diamond and other materials, which might provide opportunities to single-dopant transport or single-photon source beneficial to quantum processing.
| Original language | English |
|---|---|
| Title of host publication | 2014 IEEE Silicon Nanoelectronics Workshop (SNW 2014) |
| Subtitle of host publication | Honolulu, Hawaii, USA 8-9 June 2014 |
| Place of Publication | Piscataway, NJ |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 1-2 |
| Number of pages | 2 |
| ISBN (Electronic) | 9781479956777 |
| ISBN (Print) | 9781479956784 |
| DOIs | |
| Publication status | Published - 2014 |
| Externally published | Yes |
| Event | Silicon Nanoelectronics Workshop, SNW 2014 - Honolulu, United States Duration: 8 Jun 2014 → 9 Jun 2014 |
Other
| Other | Silicon Nanoelectronics Workshop, SNW 2014 |
|---|---|
| Country/Territory | United States |
| City | Honolulu |
| Period | 8/06/14 → 9/06/14 |
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