Performance enhancement of electronic sensor through mask-less lithography

Anindya Nag, Asif I. Zia, S. C. Mukhopadhyay, Jurgen Kosel

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionResearchpeer-review

Abstract

The escalating applications of miniaturized sensors have led the microelectronics industry to stay abreast with the precise micro-fabrication technologies. The following article describes a new technique for the fabrication of miniaturized interdigitated capacitive sensors that own highly sensitive and real-time detections capabilities. In standard lithographic procedure, the sensors are fabricated applying different photoresist materials that give rise to the variable characteristic profile of the fabricated product. Single crystal p-doped Silicon wafer was used as a substrate material due to its advantageous properties over Germanium. Heidelberg system was used for the maskless lithographic patterning of the new interdigital sensors on a silicon substrate. The process was carried out in a clean room in the absence of ultraviolet light at a fixed temperature. The fabricated sensors were used for inflammable gas sensing application. Electrochemical Impedance Spectroscopy was applied to read the resistive and capacitive impedance measured by the sensor. The results proclaimed that the fabricated sensors own better performance in LPG detection as compared to its commercial counterparts.

LanguageEnglish
Title of host publicationICST 2015
Subtitle of host publicationproceedings of the 9th International Conference on Sensing Technology
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages374-379
Number of pages6
ISBN (Electronic)9781479963140
DOIs
Publication statusPublished - 2015
Externally publishedYes
Event9th International Conference on Sensing Technology, ICST 2015 - Auckland, New Zealand
Duration: 8 Dec 201511 Dec 2015

Other

Other9th International Conference on Sensing Technology, ICST 2015
CountryNew Zealand
CityAuckland
Period8/12/1511/12/15

Fingerprint

Lithography
Masks
Sensors
Clean rooms
Capacitive sensors
Microfabrication
Liquefied petroleum gas
Substrates
Photoresists
Electrochemical impedance spectroscopy
Silicon wafers
Germanium
Microelectronics
Single crystals
Fabrication
Silicon
Gases
Industry
Temperature

Keywords

  • ablation
  • Maskless Lithography
  • photoresist
  • silicon wafers
  • sputtering
  • wire bonding

Cite this

Nag, A., Zia, A. I., Mukhopadhyay, S. C., & Kosel, J. (2015). Performance enhancement of electronic sensor through mask-less lithography. In ICST 2015: proceedings of the 9th International Conference on Sensing Technology (pp. 374-379). Piscataway, NJ: Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/ICSensT.2015.7438426
Nag, Anindya ; Zia, Asif I. ; Mukhopadhyay, S. C. ; Kosel, Jurgen. / Performance enhancement of electronic sensor through mask-less lithography. ICST 2015: proceedings of the 9th International Conference on Sensing Technology. Piscataway, NJ : Institute of Electrical and Electronics Engineers (IEEE), 2015. pp. 374-379
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Nag, A, Zia, AI, Mukhopadhyay, SC & Kosel, J 2015, Performance enhancement of electronic sensor through mask-less lithography. in ICST 2015: proceedings of the 9th International Conference on Sensing Technology. Institute of Electrical and Electronics Engineers (IEEE), Piscataway, NJ, pp. 374-379, 9th International Conference on Sensing Technology, ICST 2015, Auckland, New Zealand, 8/12/15. https://doi.org/10.1109/ICSensT.2015.7438426

Performance enhancement of electronic sensor through mask-less lithography. / Nag, Anindya; Zia, Asif I.; Mukhopadhyay, S. C.; Kosel, Jurgen.

ICST 2015: proceedings of the 9th International Conference on Sensing Technology. Piscataway, NJ : Institute of Electrical and Electronics Engineers (IEEE), 2015. p. 374-379.

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionResearchpeer-review

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Nag A, Zia AI, Mukhopadhyay SC, Kosel J. Performance enhancement of electronic sensor through mask-less lithography. In ICST 2015: proceedings of the 9th International Conference on Sensing Technology. Piscataway, NJ: Institute of Electrical and Electronics Engineers (IEEE). 2015. p. 374-379 https://doi.org/10.1109/ICSensT.2015.7438426