Performance enhancement of elemental copper vapor lasers by bromine and hydrogenated bromine additives

Robert J. Carman, Michael J. Withford, D. J. W. Brown, James A. Piper

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    The results of a detailed study investigating the effects of HBr, Br donors and other halogens on the electrical and optical lasing characteristics in an elemental copper vapor laser is reported.

    Original languageEnglish
    Pages (from-to)68-71
    Number of pages4
    JournalProceedings of SPIE - The International Society for Optical Engineering
    Volume3092
    DOIs
    Publication statusPublished - 1997

    Keywords

    • buffer gas additives
    • copper vapour laser
    • dissociative attachment
    • halogens
    • HBr
    • hydrogen
    • plasma kinetics

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