Abstract
The results of a detailed study investigating the effects of HBr, Br donors and other halogens on the electrical and optical lasing characteristics in an elemental copper vapor laser is reported.
Original language | English |
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Pages (from-to) | 68-71 |
Number of pages | 4 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 3092 |
DOIs | |
Publication status | Published - 1997 |
Keywords
- buffer gas additives
- copper vapour laser
- dissociative attachment
- halogens
- HBr
- hydrogen
- plasma kinetics