Performance enhancement of elemental copper vapor lasers by bromine and hydrogenated bromine additives

Robert J. Carman, Michael J. Withford, D. J. W. Brown, James A. Piper

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The results of a detailed study investigating the effects of HBr, Br donors and other halogens on the electrical and optical lasing characteristics in an elemental copper vapor laser is reported.

Original languageEnglish
Pages (from-to)68-71
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3092
DOIs
Publication statusPublished - 1997

Keywords

  • buffer gas additives
  • copper vapour laser
  • dissociative attachment
  • halogens
  • HBr
  • hydrogen
  • plasma kinetics

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