Plasma kinetics issues during the excitation phase in an elemental copper vapour laser

influence of the 'phantom current' on the formation of laser output

R. J. Carman*, G. P. Hogan, C. E. Webb

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contribution

Abstract

A detailed computer model has been used to simulate plasma kinetics and lasing behavior during the excitation phase of discharge current, also known as phantom current. Results indicate that the phantom current can indeed be attributed to the acceleration and drift of the pre-pulse electrons which occurs as the electron temperature is raised to approx. 2-3eV corresponding to the threshold energies required for excitation of Cu states. The phantom current also coincides with a local minimum of the plasma resistivity which occurs as a result of the complex interplay between the electron temperature and the overall electron-heavy particle collision frequency. These results are compared with experimental data for I-V characteristics, radially and time resolved hook population densities for selected Cu I states, electron densities, and laser pulse intensities.

Original languageEnglish
Title of host publicationConference on Lasers and Electro-Optics Europe - Technical Digest
Place of PublicationPiscataway, N.J.
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Pages276
Number of pages1
ISBN (Electronic)0780342348
ISBN (Print)078034233X
DOIs
Publication statusPublished - Sep 1998
EventProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98 - Glasgow, Scotland
Duration: 14 Sep 199818 Sep 1998

Other

OtherProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98
CityGlasgow, Scotland
Period14/09/9818/09/98

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