Plasma kinetics issues during the excitation phase in an elemental copper vapour laser: influence of the 'phantom current' on the formation of laser output

R. J. Carman*, G. P. Hogan, C. E. Webb

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

    Abstract

    A detailed computer model has been used to simulate plasma kinetics and lasing behavior during the excitation phase of discharge current, also known as phantom current. Results indicate that the phantom current can indeed be attributed to the acceleration and drift of the pre-pulse electrons which occurs as the electron temperature is raised to approx. 2-3eV corresponding to the threshold energies required for excitation of Cu states. The phantom current also coincides with a local minimum of the plasma resistivity which occurs as a result of the complex interplay between the electron temperature and the overall electron-heavy particle collision frequency. These results are compared with experimental data for I-V characteristics, radially and time resolved hook population densities for selected Cu I states, electron densities, and laser pulse intensities.

    Original languageEnglish
    Title of host publicationConference on Lasers and Electro-Optics Europe - Technical Digest
    Place of PublicationPiscataway, N.J.
    PublisherInstitute of Electrical and Electronics Engineers (IEEE)
    Pages276
    Number of pages1
    ISBN (Electronic)0780342348
    ISBN (Print)078034233X
    DOIs
    Publication statusPublished - Sept 1998
    EventProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98 - Glasgow, Scotland
    Duration: 14 Sept 199818 Sept 1998

    Other

    OtherProceedings of the 1998 International Symposium on Information Theory, CLEO/EUROPE'98
    CityGlasgow, Scotland
    Period14/09/9818/09/98

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