Point-by-point inscription of narrow-band gratings in polymer ridge waveguides

A. J. Lee; A. Rahmani; J. M. Dawes; G. D. Marshall; M. J. Withford

doi:10.1007/s00339-007-4261-9

Point-by-point inscription of narrow-band gratings in polymer ridge waveguides

A. J. Lee, A. Rahmani, J. M. Dawes, G. D. Marshall, M. J. Withford^*

^*Corresponding author for this work

MQ Photonics Research Centre

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

We report the point-by-point inscription of gratings in lithographically fabricated polymer ridge waveguides using direct-write laser processing. This device exhibited narrow-band-pass spectral features of ∼0.8 nm full-width-half-maximum, suitable for wavelength division multiplexing applications.

Original language	English
Pages (from-to)	273-276
Number of pages	4
Journal	Applied Physics A: Materials Science & Processing
Volume	90
Issue number	2
DOIs	https://doi.org/10.1007/s00339-007-4261-9
Publication status	Published - Feb 2008

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title = "Point-by-point inscription of narrow-band gratings in polymer ridge waveguides",

abstract = "We report the point-by-point inscription of gratings in lithographically fabricated polymer ridge waveguides using direct-write laser processing. This device exhibited narrow-band-pass spectral features of ∼0.8 nm full-width-half-maximum, suitable for wavelength division multiplexing applications.",

author = "Lee, {A. J.} and A. Rahmani and Dawes, {J. M.} and Marshall, {G. D.} and Withford, {M. J.}",

year = "2008",

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AU - Lee, A. J.

AU - Rahmani, A.

AU - Dawes, J. M.

AU - Marshall, G. D.

AU - Withford, M. J.

PY - 2008/2

Y1 - 2008/2

N2 - We report the point-by-point inscription of gratings in lithographically fabricated polymer ridge waveguides using direct-write laser processing. This device exhibited narrow-band-pass spectral features of ∼0.8 nm full-width-half-maximum, suitable for wavelength division multiplexing applications.

AB - We report the point-by-point inscription of gratings in lithographically fabricated polymer ridge waveguides using direct-write laser processing. This device exhibited narrow-band-pass spectral features of ∼0.8 nm full-width-half-maximum, suitable for wavelength division multiplexing applications.

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DO - 10.1007/s00339-007-4261-9

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EP - 276

JO - Applied Physics A: Materials Science & Processing

JF - Applied Physics A: Materials Science & Processing

IS - 2

ER -

Point-by-point inscription of narrow-band gratings in polymer ridge waveguides

Abstract

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