Abstract
We present the status of optical field ionization soft X-ray lasers. The amplifying medium is generated by focusing a high-energy circularly polarized 30-fs 10-Hz Ti: sapphire laser system in a gaseous medium. Using xenon or krypton, strong laser emission at 41.8 and 32.8 nm, respectively, has been observed. After presenting the basis of the physics, we present recent characterization of the sources as well as dramatic improvement of their performances using the waveguiding technique.
Original language | English |
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Pages (from-to) | 1351-1362 |
Number of pages | 12 |
Journal | IEEE Journal on Selected Topics in Quantum Electronics |
Volume | 10 |
Issue number | 6 |
DOIs | |
Publication status | Published - Nov 2004 |
Externally published | Yes |
Keywords
- High-intensity laser
- Laser plasma
- Optical field ionization (OFI)
- X-ray laser (XRL)