Abstract
GaP/active-Si junctions were grown by metalorganic chemical vapor deposition via a previously developed process that yields GaP-on-Si integration free of heterovalent-related defects. N-type Si emitter layers were grown on p-type (100)-oriented Si substrates, followed by the growth of n-type GaP window layers, to form fully-active sub-cell structures compatible with integration into monolithic III-V/Si multijunction solar cells. Si bulk minority carrier lifetime was found to track the epitaxial process, with initial degradation followed by full recovery. Fabricated test devices from in-situ (all-epitaxial) GaP/Si structures yielded good preliminary performance characteristics and demonstrate great promise for the epitaxial sub-cell approach. Additional test structures based on ex-situ diffusion processed solar wafers demonstrate the impact and importance of back surface field layers for such sub-cells.
Original language | English |
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Title of host publication | 2014 IEEE 40th Photovoltaic Specialists Conference (PVSC) |
Place of Publication | Piscataway, NJ |
Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
Pages | 3439-3442 |
Number of pages | 4 |
Volume | 2 |
ISBN (Electronic) | 9781509037797 |
ISBN (Print) | 9781509037803 |
DOIs | |
Publication status | Published - 2014 |
Externally published | Yes |
Event | 40th IEEE Photovoltaic Specialists Conference, PVSC 2014 - Denver, United States Duration: 8 Jun 2014 → 13 Jun 2014 |
Conference
Conference | 40th IEEE Photovoltaic Specialists Conference, PVSC 2014 |
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Country/Territory | United States |
City | Denver |
Period | 8/06/14 → 13/06/14 |