Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography

M. Ekberg*, F. Nikolajeff, M. Larsson, S. Hard

*Corresponding author for this work

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Proximity-compensated, as well as uncompensated, blazed transmission gratings with periods of 4, 8, and 16 μm were manufactured with direct-writing, electron-beam lithography in positive resist. The compensated gratings performed better than the uncompensated ones. For the 4-μm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The compensation was made by repeated convolutions in the spatial domain with the electron-beam point spread function. We determined this function by retrieving the phase from the measured diffraction pattern of the uncompensated gratings.

Original languageEnglish
Pages (from-to)103-107
Number of pages5
JournalDoktorsavhandlingar vid Chalmers Tekniska Hogskola
Issue number1263
Publication statusPublished - 1997

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