Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography

M. Ekberg*, F. Nikolajeff, M. Larsson, S. Hard

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    9 Citations (Scopus)


    Proximity-compensated, as well as uncompensated, blazed transmission gratings with periods of 4, 8, and 16 μm were manufactured with direct-writing, electron-beam lithography in positive resist. The compensated gratings performed better than the uncompensated ones. For the 4-μm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The compensation was made by repeated convolutions in the spatial domain with the electron-beam point spread function. We determined this function by retrieving the phase from the measured diffraction pattern of the uncompensated gratings.

    Original languageEnglish
    Pages (from-to)103-107
    Number of pages5
    JournalDoktorsavhandlingar vid Chalmers Tekniska Hogskola
    Issue number1263
    Publication statusPublished - 1997


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