Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography

M. Ekberg, F. Nikolajeff, M. Larsson, S. Hard

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    36 Citations (Scopus)

    Abstract

    Proximity-compensated, as well as uncompensated, blazed transmission gratings with periods of 4, 8, and 16 μm were manufactured with direct-writing, electron-beam lithography in positive resist. The compensated gratings performed better than the uncompensated ones. For the 4-μm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The compensation was made by repeated convolutions in the spatial domain with the electron-beam point spread function. We determined this function by retrieving the phase from the measured diffraction pattern of the uncompensated gratings.

    Original languageEnglish
    Pages (from-to)103-107
    Number of pages5
    JournalApplied Optics
    Volume33
    Issue number1
    DOIs
    Publication statusPublished - 1994

    Keywords

    • Blazed phase gratings
    • Diffractive optics
    • Direct-writing
    • Electron point-spread function
    • Electron-beam lithography
    • Proximity compensation

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