Pulsed VUV sources and their application to surface cleaning of optical materials

D. M. Kane; D. Hirschausen; B. K. Ward; R. J. Carman; R. P. Mildren

doi:10.1117/12.552735

Pulsed VUV sources and their application to surface cleaning of optical materials

D. M. Kane^*, D. Hirschausen, B. K. Ward, R. J. Carman, R. P. Mildren

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Development of pulsed excitation techniques for high-pressure dielectric barrier discharges (DBD) has led to a short-pulsed, high-peak-power, spatially uniform source of UV7VUV radiation - a preferred type of output for materials processing and many other applications. Results of such a Xe₂* DBD source at 172 nm for removing mountants from optical surfaces and for removing hydrocarbon contamination from optical and polymer surfaces are presented.

Original language	English
Pages (from-to)	100-106
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5399
DOIs	https://doi.org/10.1117/12.552735
Publication status	Published - 2004

Keywords

DBD
Glass cleaning
Optical surface cleaning
Polymers
Short pulse VUV source
Surface cleaning
Surface treatment

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abstract = "Development of pulsed excitation techniques for high-pressure dielectric barrier discharges (DBD) has led to a short-pulsed, high-peak-power, spatially uniform source of UV7VUV radiation - a preferred type of output for materials processing and many other applications. Results of such a Xe2* DBD source at 172 nm for removing mountants from optical surfaces and for removing hydrocarbon contamination from optical and polymer surfaces are presented.",

keywords = "DBD, Glass cleaning, Optical surface cleaning, Polymers, Short pulse VUV source, Surface cleaning, Surface treatment",

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AU - Carman, R. J.

AU - Mildren, R. P.

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AB - Development of pulsed excitation techniques for high-pressure dielectric barrier discharges (DBD) has led to a short-pulsed, high-peak-power, spatially uniform source of UV7VUV radiation - a preferred type of output for materials processing and many other applications. Results of such a Xe2* DBD source at 172 nm for removing mountants from optical surfaces and for removing hydrocarbon contamination from optical and polymer surfaces are presented.

KW - DBD

KW - Glass cleaning

KW - Optical surface cleaning

KW - Polymers

KW - Short pulse VUV source

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KW - Surface treatment

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Pulsed VUV sources and their application to surface cleaning of optical materials

Abstract

Keywords

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