Raman study of stress effect in silicon rich carbide (SiCX) film by furnace and rapid thermal annealing for photovoltaic application

Zhenyu Wan*, Shujuan Huang, Martin A. Green, Gavin Conibeer

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

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Engineering & Materials Science