Recent advances in subaperture stitching interferometry

Paul E. Murphy, Greg W. Forbes, Jon F. Fleig, Dragisha Miladinovic, Gary DeVries, Stephen O'Donohue

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

7 Citations (Scopus)

Abstract

It is well known that stitching can boost the aperture capability. Stitching can also improve the accuracy, lateral resolution, and testable aspheric departure. We demonstrate these improvements on our subaperture stitching interferometer (SSI®).

Original languageEnglish
Title of host publicationOptical Fabrication and Testing, OFT 2006
Place of PublicationWashington, DC
PublisherOptical Society of America (OSA)
Pages1-3
Number of pages3
ISBN (Print)1557528187, 9781557528186
DOIs
Publication statusPublished - 2006
Externally publishedYes
EventOptical Fabrication and Testing, OFT 2006 - Rochester, NY, United States
Duration: 10 Oct 200610 Oct 2006

Other

OtherOptical Fabrication and Testing, OFT 2006
CountryUnited States
CityRochester, NY
Period10/10/0610/10/06

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