Abstract
It is well known that stitching can boost the aperture capability. Stitching can also improve the accuracy, lateral resolution, and testable aspheric departure. We demonstrate these improvements on our subaperture stitching interferometer (SSI®).
Original language | English |
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Title of host publication | Optical Fabrication and Testing, OFT 2006 |
Place of Publication | Washington, DC |
Publisher | Optical Society of America (OSA) |
Pages | 1-3 |
Number of pages | 3 |
ISBN (Print) | 1557528187, 9781557528186 |
DOIs | |
Publication status | Published - 2006 |
Externally published | Yes |
Event | Optical Fabrication and Testing, OFT 2006 - Rochester, NY, United States Duration: 10 Oct 2006 → 10 Oct 2006 |
Other
Other | Optical Fabrication and Testing, OFT 2006 |
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Country/Territory | United States |
City | Rochester, NY |
Period | 10/10/06 → 10/10/06 |