Selective area epitaxial growth of InP nanowire array for solar cell applications

Q. Gao, L. Fu, F. Wang, Y. Guo, Z. Y. Li, K. Peng, Li Li, Z. Li, Y. Wenas, S. Mokkapati, H. H. Tan, C. Jagadish

    Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

    1 Citation (Scopus)

    Abstract

    InP nanowire arrays have been grown and optimized using selective area epitaxy by metalorganic chemical vapour deposition technique. High quality stacking fault free wurtzite nanowires with a wide range of diameters and room temperature minority carrier lifetime as high as ∼ 1.6 ns have been obtained. An axially doped n-i-p structure was further grown and successfully fabricated into solar cell devices. The photovoltaic behaviors of the device have been investigated and compared to simulation results.

    Original languageEnglish
    Title of host publicationCOMMAD 2014
    Subtitle of host publicationConference on Optoelectronic and Microelectronic Materials and Devices
    Place of PublicationPiscataway, NJ
    PublisherInstitute of Electrical and Electronics Engineers (IEEE)
    Pages252-253
    Number of pages2
    ISBN (Electronic)9781479968688
    ISBN (Print)9781479968671
    DOIs
    Publication statusPublished - 10 Feb 2014
    Event2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 - Perth, Australia
    Duration: 14 Dec 201417 Dec 2014

    Other

    Other2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014
    Country/TerritoryAustralia
    CityPerth
    Period14/12/1417/12/14

    Keywords

    • MOCVD
    • nanowire
    • selective area epitaxy
    • solar cell

    Fingerprint

    Dive into the research topics of 'Selective area epitaxial growth of InP nanowire array for solar cell applications'. Together they form a unique fingerprint.

    Cite this