Abstract
InP nanowire arrays have been grown and optimized using selective area epitaxy by metalorganic chemical vapour deposition technique. High quality stacking fault free wurtzite nanowires with a wide range of diameters and room temperature minority carrier lifetime as high as ∼ 1.6 ns have been obtained. An axially doped n-i-p structure was further grown and successfully fabricated into solar cell devices. The photovoltaic behaviors of the device have been investigated and compared to simulation results.
| Original language | English |
|---|---|
| Title of host publication | COMMAD 2014 |
| Subtitle of host publication | Conference on Optoelectronic and Microelectronic Materials and Devices |
| Place of Publication | Piscataway, NJ |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 252-253 |
| Number of pages | 2 |
| ISBN (Electronic) | 9781479968688 |
| ISBN (Print) | 9781479968671 |
| DOIs | |
| Publication status | Published - 10 Feb 2014 |
| Event | 2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 - Perth, Australia Duration: 14 Dec 2014 → 17 Dec 2014 |
Other
| Other | 2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 |
|---|---|
| Country/Territory | Australia |
| City | Perth |
| Period | 14/12/14 → 17/12/14 |
Keywords
- MOCVD
- nanowire
- selective area epitaxy
- solar cell
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