Shape distortion of diffractive optical elements, directly written with electron beam lithography

F. Nikolajeff; M. Ekbery; M. Larsson; J. Bengtsson; S. Hard

Shape distortion of diffractive optical elements, directly written with electron beam lithography

F. Nikolajeff^*, M. Ekbery, M. Larsson, J. Bengtsson, S. Hard

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Here, we used repeated development to study the relief shape as a function of development time for a blazed grating structure exposed in a thick, resist layer. The shape was obtained from measured diffraction data. This shape determining method appears to have a better accuracy than stylus measurements.

Original language	English
Pages (from-to)	60-61
Number of pages	2
Journal	IEE Conference Publication
Issue number	379
Publication status	Published - 1993

Cite this

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title = "Shape distortion of diffractive optical elements, directly written with electron beam lithography",

abstract = "Here, we used repeated development to study the relief shape as a function of development time for a blazed grating structure exposed in a thick, resist layer. The shape was obtained from measured diffraction data. This shape determining method appears to have a better accuracy than stylus measurements.",

author = "F. Nikolajeff and M. Ekbery and M. Larsson and J. Bengtsson and S. Hard",

year = "1993",

language = "English",

pages = "60--61",

journal = "IEE Conference Publication",

issn = "0537-9989",

publisher = "Institution of Engineering and Technology",

number = "379",

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TY - JOUR

T1 - Shape distortion of diffractive optical elements, directly written with electron beam lithography

AU - Nikolajeff, F.

AU - Ekbery, M.

AU - Larsson, M.

AU - Bengtsson, J.

AU - Hard, S.

PY - 1993

Y1 - 1993

N2 - Here, we used repeated development to study the relief shape as a function of development time for a blazed grating structure exposed in a thick, resist layer. The shape was obtained from measured diffraction data. This shape determining method appears to have a better accuracy than stylus measurements.

AB - Here, we used repeated development to study the relief shape as a function of development time for a blazed grating structure exposed in a thick, resist layer. The shape was obtained from measured diffraction data. This shape determining method appears to have a better accuracy than stylus measurements.

UR - https://www.scopus.com/pages/publications/0027843345

M3 - Article

AN - SCOPUS:0027843345

SN - 0537-9989

SP - 60

EP - 61

JO - IEE Conference Publication

JF - IEE Conference Publication

IS - 379

ER -

Shape distortion of diffractive optical elements, directly written with electron beam lithography

Abstract

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