Abstract
The scattering properties of a plasmonic array can be reinforced by placing the array near a planar reflector. Finite-Difference-Time-Domain (FDTD) simulations have been used to demonstrate the key design challenge of modulating the electric field that drives the plasmonic scattering, by varying the distance of a single Ag nanodisc from a Ag reflector. We show that the thickness of the dielectric separation layer plays a critical role in determining the spectral characteristics and the intensity of the power scattered by a Ag nanodisc near a reflector. A possible application of the designed structure as a plasmonic light-trap for thin Si solar cells is also experimentally demonstrated. Electron-beam lithography has been used to fabricate a pseudo-random array of 150nm plasmonic Ag nanodiscs on SiO2 on a Ag reflector substrate. The plasmonic reflector shows a high diffuse reflectance of ∼54% in the near-infrared, near-bandgap 600-900nm wavelength region for thin Si solar cells, with a low broadband absorption loss of ∼18%. Wavelength-angle resolved scattering measurements indicate an angular scattering range between 20° to 80° with maximum intensity of the scattered power in the 20° to 60° angular range.
Original language | English |
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Title of host publication | Plasmonics: Metallic Nanostructures and Their Optical Properties X |
Editors | Mark I. Stockman |
Pages | 845721-1-845721-6 |
Number of pages | 6 |
Volume | 8457 |
DOIs | |
Publication status | Published - 2012 |
Event | Plasmonics: Metallic Nanostructures and Their Optical Properties X - San Diego, CA, United States Duration: 12 Aug 2012 → 16 Aug 2012 |
Other
Other | Plasmonics: Metallic Nanostructures and Their Optical Properties X |
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Country/Territory | United States |
City | San Diego, CA |
Period | 12/08/12 → 16/08/12 |
Keywords
- Ag
- Electron beam lithography
- FDTD
- Nanodisc
- Plasmonic
- Reflector
- Scattering
- Solar cells