Abstract
A pulsed I-V thermal resistance R-th measurement method is formulated and applied on-wafer to a GaAs MMIC pHEMT. An investigation of device dispersion phenomena assesses their impact on the measurement. It is found that performing the R-th measurement using two quiescent bias points in close proximity (situated beyond the knee voltage yet prior to drain voltages that result in significant levels of gate leakage due to impact ionization) improves the accuracy of the method. Extraction of thermal coefficients characterizes the drain current reduction due to heating, allowing for an efficient calculation of R-th with improved precision.
| Original language | English |
|---|---|
| Title of host publication | 2013 81st ARFTG Microwave Measurement Conference (ARFTG) |
| Place of Publication | Piscataway, NJ |
| Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
| Pages | 1-6 |
| Number of pages | 6 |
| ISBN (Electronic) | 9781467349833, 9781467349826 |
| ISBN (Print) | 9781467349819 |
| DOIs | |
| Publication status | Published - 2013 |
| Event | 81st ARFTG Microwave Measurement Conference on Metrology for High Speed Circuits and Systems - Seattle Duration: 7 Jun 2013 → … |
Conference
| Conference | 81st ARFTG Microwave Measurement Conference on Metrology for High Speed Circuits and Systems |
|---|---|
| City | Seattle |
| Period | 7/06/13 → … |
Keywords
- HEMTs
- MMICs
- pulse measurements
- temperature measurement
- thermal resistance
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