Subaperture stitching interferometry of high-departure aspheres by incorporating a variable optical null

M. Tricard*, A. Kulawiec, M. Bauer, G. Devries, J. Fleig, G. Forbes, D. Miladinovich, P. Murphy

*Corresponding author for this work

Research output: Contribution to journalArticle

49 Citations (Scopus)

Abstract

Originally, subaperture stitching interferometry enabled full-aperture measurement of large-aperture spheres and flats using 4″ or 6″ interferometers and transmission elements. Later, mild aspheric surfaces could be measured using the same fundamental principles. In both cases, stitching algorithms automatically compensate for systematic reference wavefront and distortion errors. Aspheres with up to 1000 waves of departure from best-fit sphere can be measured without dedicated null lenses using a variable optical null (VON™) device which generates an optical wavefront that closely matches the surface of the asphere within a local subaperture. This paper presents the principles of subaperture stitching interferometry incorporating VON technology.

Original languageEnglish
Pages (from-to)547-550
Number of pages4
JournalCIRP Annals - Manufacturing Technology
Volume59
Issue number1
DOIs
Publication statusPublished - 2010
Externally publishedYes

Keywords

  • Asphere
  • Interferometry
  • Metrology

Fingerprint Dive into the research topics of 'Subaperture stitching interferometry of high-departure aspheres by incorporating a variable optical null'. Together they form a unique fingerprint.

Cite this