Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson; Mats Ekberg; Fredrik Nikolajeff; Sverker Hard

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson^*, Mats Ekberg, Fredrik Nikolajeff, Sverker Hard

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

Original language	English
Pages (from-to)	1176-1179
Number of pages	4
Journal	Doktorsavhandlingar vid Chalmers Tekniska Hogskola
Issue number	1263
Publication status	Published - 1997

Cite this

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title = "Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography",

abstract = "It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.",

author = "Michael Larsson and Mats Ekberg and Fredrik Nikolajeff and Sverker Hard",

year = "1997",

language = "English",

pages = "1176--1179",

journal = "Doktorsavhandlingar vid Chalmers Tekniska Hogskola",

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publisher = "Chalmers Tekniska Hoegskola",

number = "1263",

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TY - JOUR

T1 - Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

AU - Larsson, Michael

AU - Ekberg, Mats

AU - Nikolajeff, Fredrik

AU - Hard, Sverker

PY - 1997

Y1 - 1997

N2 - It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

AB - It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

UR - http://www.scopus.com/inward/record.url?scp=0030730427&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0030730427

SN - 0346-718X

SP - 1176

EP - 1179

JO - Doktorsavhandlingar vid Chalmers Tekniska Hogskola

JF - Doktorsavhandlingar vid Chalmers Tekniska Hogskola

IS - 1263

ER -

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Abstract

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