Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson; Mats Ekberg; Fredrik Nikolajeff; Sverker Hård

doi:10.1364/AO.33.001176

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson^*, Mats Ekberg, Fredrik Nikolajeff, Sverker Hård

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

27 Citations (Scopus)

Abstract

It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

Original language	English
Pages (from-to)	1176-1179
Number of pages	4
Journal	Applied Optics
Volume	33
Issue number	7
DOIs	https://doi.org/10.1364/AO.33.001176
Publication status	Published - 1994

Keywords

Binary phase gratings
Blazed phase gratings
Development
Diffractive optics
Direct writing
Electron-beam lithography
Optimization
Resist kinoforms

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10.1364/AO.33.001176

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abstract = "It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.",

keywords = "Binary phase gratings, Blazed phase gratings, Development, Diffractive optics, Direct writing, Electron-beam lithography, Optimization, Resist kinoforms",

author = "Michael Larsson and Mats Ekberg and Fredrik Nikolajeff and Sverker H{\aa}rd",

year = "1994",

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AU - Ekberg, Mats

AU - Nikolajeff, Fredrik

AU - Hård, Sverker

PY - 1994

Y1 - 1994

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AB - It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

KW - Binary phase gratings

KW - Blazed phase gratings

KW - Development

KW - Diffractive optics

KW - Direct writing

KW - Electron-beam lithography

KW - Optimization

KW - Resist kinoforms

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VL - 33

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EP - 1179

JO - Applied Optics

JF - Applied Optics

IS - 7

ER -

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Abstract

Keywords

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