Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

Michael Larsson*, Mats Ekberg, Fredrik Nikolajeff, Sverker Hård

*Corresponding author for this work

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

It is shown that multilevel SAL 110 resist kinoforms can be developed stepwise. Measurements of the kinoform diffraction pattern, performed between the development steps, permitted correct final developments to be made. No significant relief shape degradation was observed for development times as high as 25 min. The results imply that the electron-beam exposure doses, and hence the exposure time, can be reduced by a factor of 3 compared with doses used currently.

Original languageEnglish
Pages (from-to)1176-1179
Number of pages4
JournalApplied Optics
Volume33
Issue number7
DOIs
Publication statusPublished - 1994

Keywords

  • Binary phase gratings
  • Blazed phase gratings
  • Development
  • Diffractive optics
  • Direct writing
  • Electron-beam lithography
  • Optimization
  • Resist kinoforms

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