Surface cleaning of optical materials using novel VUV sources

D. M. Kane; D. Hirschausen; B. K. Ward; R. P. Mildren; R. J. Carman

doi:10.1142/9789812706843_0013

Surface cleaning of optical materials using novel VUV sources

D. M. Kane, D. Hirschausen, B. K. Ward, R. P. Mildren, R. J. Carman

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

6 Citations (Scopus)

Abstract

Short pulsed, high peak power VUV output has been obtained from pulsed voltage excitation of high pressure dielectric barrier discharges (DBD). Output with these characteristics has demonstrated advantage over longer pulse DBD VUV sources for several materials processing and surface modification applications. Results using a Xe₂' DBD source at 172 nm for removing optical mountants from optical surfaces, for removing hydrocarbon contamination from optical and polymer surfaces, and dehydroxylation of fused silica are presented. Guidelines.

Original language	English
Title of host publication	Laser cleaning II
Editors	D Kane
Place of Publication	Singapore
Publisher	World Scientific Publishing
Pages	243-256
Number of pages	14
ISBN (Electronic)	9789812706843, 9789814476607
ISBN (Print)	9812703721, 9789812703729
DOIs	https://doi.org/10.1142/9789812706843_0013
Publication status	Published - 2006

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abstract = "Short pulsed, high peak power VUV output has been obtained from pulsed voltage excitation of high pressure dielectric barrier discharges (DBD). Output with these characteristics has demonstrated advantage over longer pulse DBD VUV sources for several materials processing and surface modification applications. Results using a Xe2' DBD source at 172 nm for removing optical mountants from optical surfaces, for removing hydrocarbon contamination from optical and polymer surfaces, and dehydroxylation of fused silica are presented. Guidelines.",

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M3 - Chapter

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Surface cleaning of optical materials using novel VUV sources

Abstract

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