The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas

R. N. Tarrant; S. Devasahayam; David R. McKenzie; Marcela M M Bilek

doi:10.1088/0963-0252/15/3/012

The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas

R. N. Tarrant^*, S. Devasahayam, David R. McKenzie, Marcela M M Bilek

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The distribution of ion dose arising from plasma immersion ion implantation (PIII) of a complex shape in the form of a wedge is measured. Two types of plasma are considered: a drifting titanium plasma derived from a pulsed cathodic arc and a stationary plasma generated by PIII pulses in oxygen or nitrogen gas. The distributions of the implanted material over the surface of the aluminium wedge were studied using secondary ion mass spectroscopy and Rutherford backscattering. The effects of varying the apex angles of the wedge and the plasma density are investigated. We conclude that ion-focusing effects at the apex of the wedge were more important for the drifting plasma than for the stationary plasmas. In a drifting plasma, the ion drift velocity directed towards the apex of the wedge compresses the sheath close to the apex and enhances the concentration of the dose. For the stationary plasma, the dose is more uniform.

Original language	English
Pages (from-to)	384-390
Number of pages	7
Journal	Plasma Sources Science and Technology
Volume	15
Issue number	3
DOIs	https://doi.org/10.1088/0963-0252/15/3/012
Publication status	Published - Aug 2006
Externally published	Yes

Keywords

SHEATH STRUCTURE
SHAPED TARGET
CATHODIC ARC
TRANSPORT

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10.1088/0963-0252/15/3/012

Cite this

@article{cfd7676c618a49a8ba9e32e8b9ad62f5,

title = "The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas",

abstract = "The distribution of ion dose arising from plasma immersion ion implantation (PIII) of a complex shape in the form of a wedge is measured. Two types of plasma are considered: a drifting titanium plasma derived from a pulsed cathodic arc and a stationary plasma generated by PIII pulses in oxygen or nitrogen gas. The distributions of the implanted material over the surface of the aluminium wedge were studied using secondary ion mass spectroscopy and Rutherford backscattering. The effects of varying the apex angles of the wedge and the plasma density are investigated. We conclude that ion-focusing effects at the apex of the wedge were more important for the drifting plasma than for the stationary plasmas. In a drifting plasma, the ion drift velocity directed towards the apex of the wedge compresses the sheath close to the apex and enhances the concentration of the dose. For the stationary plasma, the dose is more uniform.",

keywords = "SHEATH STRUCTURE, SHAPED TARGET, CATHODIC ARC, TRANSPORT",

author = "Tarrant, {R. N.} and S. Devasahayam and McKenzie, {David R.} and Bilek, {Marcela M M}",

year = "2006",

month = aug,

doi = "10.1088/0963-0252/15/3/012",

language = "English",

volume = "15",

pages = "384--390",

journal = "Plasma Sources Science and Technology",

issn = "0963-0252",

publisher = "IOP Publishing",

number = "3",

}

TY - JOUR

T1 - The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas

AU - Tarrant, R. N.

AU - Devasahayam, S.

AU - McKenzie, David R.

AU - Bilek, Marcela M M

PY - 2006/8

Y1 - 2006/8

N2 - The distribution of ion dose arising from plasma immersion ion implantation (PIII) of a complex shape in the form of a wedge is measured. Two types of plasma are considered: a drifting titanium plasma derived from a pulsed cathodic arc and a stationary plasma generated by PIII pulses in oxygen or nitrogen gas. The distributions of the implanted material over the surface of the aluminium wedge were studied using secondary ion mass spectroscopy and Rutherford backscattering. The effects of varying the apex angles of the wedge and the plasma density are investigated. We conclude that ion-focusing effects at the apex of the wedge were more important for the drifting plasma than for the stationary plasmas. In a drifting plasma, the ion drift velocity directed towards the apex of the wedge compresses the sheath close to the apex and enhances the concentration of the dose. For the stationary plasma, the dose is more uniform.

AB - The distribution of ion dose arising from plasma immersion ion implantation (PIII) of a complex shape in the form of a wedge is measured. Two types of plasma are considered: a drifting titanium plasma derived from a pulsed cathodic arc and a stationary plasma generated by PIII pulses in oxygen or nitrogen gas. The distributions of the implanted material over the surface of the aluminium wedge were studied using secondary ion mass spectroscopy and Rutherford backscattering. The effects of varying the apex angles of the wedge and the plasma density are investigated. We conclude that ion-focusing effects at the apex of the wedge were more important for the drifting plasma than for the stationary plasmas. In a drifting plasma, the ion drift velocity directed towards the apex of the wedge compresses the sheath close to the apex and enhances the concentration of the dose. For the stationary plasma, the dose is more uniform.

KW - SHEATH STRUCTURE

KW - SHAPED TARGET

KW - CATHODIC ARC

KW - TRANSPORT

U2 - 10.1088/0963-0252/15/3/012

DO - 10.1088/0963-0252/15/3/012

M3 - Article

SN - 0963-0252

VL - 15

SP - 384

EP - 390

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 3

ER -

The distribution and depth of ion doses implanted into wedges by plasma immersion ion implantation in drifting and stationary plasmas

Abstract

Keywords

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