The resistive-heating characterization of laser heating system and LaB 6 characterization of X-ray diffraction of beamline 12.2.2 at advanced light source

Jinyuan Yan*, Jason Knight, Martin Kunz, Selva Vennila Raju, Bin Chen, Arianna E. Gleason, Budhiram K. Godwal, Zack Geballe, Raymond Jeanloz, Simon M. Clark

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

X-ray diffraction from LaB6 standards document a precision of 478 ppm in lattice-parameter determinations for beamline 12.2.2 at Lawrence Berkeley National Laboratory′s Advanced Light Source, a facility for characterizing materials at high pressures and temperatures using laser- and resistance-heated diamond cells. Melting of Ni, Mo, Pt and W, resistively heated at 1 atm pressure in Ar, provides a validation of the beamline spectroradiometric system that is used to determine sample temperatures. The known melting temperatures, which range from 1665 to 3860 K for these metals, are all reproduced to within ±80 K.

Original languageEnglish
Pages (from-to)1179-1182
Number of pages4
JournalJournal of Physics and Chemistry of Solids
Volume71
Issue number8
DOIs
Publication statusPublished - Aug 2010
Externally publishedYes

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