Theoretical and experimental analysis of surface roughness and adhesion forces of MEMS surfaces using a novel method for making a compound sputtering target

Achieving a compound thin film with uniform thickness and high purity has always been a challenge in the applications concerning micro electro mechanical systems (MEMS). Controlling the adhesion force in micro/nanoscale is also critical. In the present study, a novel method for making a sputtering compound target is proposed for coating Ag–Au thin films with thicknesses of 120 and 500 nm on silicon substrates. The surface topography and adhesion forces of the samples were obtained using atomic force microscope (AFM). Rabinovich and Rumpf models were utilized to measure the adhesion force and compare the results with the obtained experimental values. It was found that the layer with a thickness of 500 nm has a lower adhesion force than the one with 120 nm thickness. The results further indicated that due to surface asperity radius, the adhesion achieved from the Rabinovich model was closer to the experimental values. This novel method for making a compound sputtering target has led to a lower adhesion force which can be useful for coating microgripper surfaces.