Two-photon lithography of sub-wavelength metallic structures in a polymer matrix

Shobha Shukla; Edward P. Furlani; Xavier Vidal; Mark T. Swihart; Paras N. Prasad

doi:10.1002/adma.201000059

Two-photon lithography of sub-wavelength metallic structures in a polymer matrix

Shobha Shukla, Edward P. Furlani, Xavier Vidal, Mark T. Swihart, Paras N. Prasad

Research output: Contribution to journal › Article › peer-review

69 Citations (Scopus)

Abstract

A novel method for fabricating metallic nanostructures with sub-wavelength resolution in a polymer using simultaneous two-photon initiated reduction of a metal salt and polymerization of a negative photoresist is demonstrated. Gold nanoparticle-doped lines as narrow as 200 nm were fabricated. The dependence of line-width on laser intensity and scan speed are captured well by an analytical model. We created functional gratings and planar chiral elements, characterized their optical properties, and modeled their electromagnetic response.

Original language	English
Pages (from-to)	3695-3699
Number of pages	5
Journal	Advanced Materials
Volume	22
Issue number	33
DOIs	https://doi.org/10.1002/adma.201000059
Publication status	Published - 1 Aug 2010
Externally published	Yes

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10.1002/adma.201000059

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AU - Prasad, Paras N.

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AB - A novel method for fabricating metallic nanostructures with sub-wavelength resolution in a polymer using simultaneous two-photon initiated reduction of a metal salt and polymerization of a negative photoresist is demonstrated. Gold nanoparticle-doped lines as narrow as 200 nm were fabricated. The dependence of line-width on laser intensity and scan speed are captured well by an analytical model. We created functional gratings and planar chiral elements, characterized their optical properties, and modeled their electromagnetic response.

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Two-photon lithography of sub-wavelength metallic structures in a polymer matrix

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