Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass

M. K. Bhuyan, F. Courvoisier*, P. A. Lacourt, M. Jacquot, L. Furfaro, M. J. Withford, J. M. Dudley

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference proceeding contributionpeer-review

2 Citations (Scopus)
37 Downloads (Pure)

Abstract

Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.

Original languageEnglish
Title of host publicationNonlinear Optics and Applications IV
EditorsBenjamin J. Eggleton, Alexander Luis Gaeta, Neil G. R. Broderick
Place of PublicationBellingham, WA
PublisherSPIE
Pages1-8
Number of pages8
Volume7728
ISBN (Print)9780819482013
DOIs
Publication statusPublished - Apr 2010
EventNonlinear Optics and Applications IV - Brussels, Belgium
Duration: 12 Apr 201015 Apr 2010

Other

OtherNonlinear Optics and Applications IV
CountryBelgium
CityBrussels
Period12/04/1015/04/10

Bibliographical note

Copyright 2010 Society of Photo Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

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