Abstract
Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.
Original language | English |
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Title of host publication | Nonlinear Optics and Applications IV |
Editors | Benjamin J. Eggleton, Alexander Luis Gaeta, Neil G. R. Broderick |
Place of Publication | Bellingham, WA |
Publisher | SPIE |
Pages | 1-8 |
Number of pages | 8 |
Volume | 7728 |
ISBN (Print) | 9780819482013 |
DOIs | |
Publication status | Published - Apr 2010 |
Event | Nonlinear Optics and Applications IV - Brussels, Belgium Duration: 12 Apr 2010 → 15 Apr 2010 |
Other
Other | Nonlinear Optics and Applications IV |
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Country/Territory | Belgium |
City | Brussels |
Period | 12/04/10 → 15/04/10 |