Ultrafast laser inscription is a technique to create low-loss three dimensional optical circuits within bulk dielectrics that is compatible with a wide range of optical materials. Its unique capabilities and the ability to rapid prototype and quickly iterate through different designs has made it exceptionally attractive for astrophotonics. This paper will summarize the basic aspects of ultrafast laser inscription and review recent progress in its application to astrophotonics, such as stellar interferometry.
|Title of host publication||Advances in Optical Astronomical Instrumentation 2019|
|Editors||Simon Ellis, Céline d'Orgeville|
|Place of Publication||Bellingham, Washington|
|Number of pages||2|
|Publication status||Published - 3 Jan 2020|
|Event||Advances in Optical Astronomical Instrumentation 2019 - Melbourne, Australia|
Duration: 9 Dec 2019 → 12 Dec 2019
|Name||Proceedings of SPIE|
|Conference||Advances in Optical Astronomical Instrumentation 2019|
|Period||9/12/19 → 12/12/19|
Bibliographical noteCopyright 2020 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
- Integrated optics
- Laser materials processing
- Stellar interferometry