Ultrafast laser inscription of astrophotonic integrated optical circuits

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Abstract

Ultrafast laser inscription is a technique to create low-loss three dimensional optical circuits within bulk dielectrics that is compatible with a wide range of optical materials. Its unique capabilities and the ability to rapid prototype and quickly iterate through different designs has made it exceptionally attractive for astrophotonics. This paper will summarize the basic aspects of ultrafast laser inscription and review recent progress in its application to astrophotonics, such as stellar interferometry.

Original languageEnglish
Title of host publicationAdvances in Optical Astronomical Instrumentation 2019
EditorsSimon Ellis, Céline d'Orgeville
Place of PublicationBellingham, Washington
PublisherSPIE
Number of pages2
ISBN (Electronic)9781510631472
ISBN (Print)9781510631465
DOIs
Publication statusPublished - 3 Jan 2020
EventAdvances in Optical Astronomical Instrumentation 2019 - Melbourne, Australia
Duration: 9 Dec 201912 Dec 2019

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume11203
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAdvances in Optical Astronomical Instrumentation 2019
CountryAustralia
CityMelbourne
Period9/12/1912/12/19

Bibliographical note

Copyright 2020 Society of Photo-Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

Keywords

  • Integrated optics
  • Laser materials processing
  • Stellar interferometry
  • Waveguides

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