Abstract
UV Raman and absorption measurements plots are used to demonstrate the improvement for InN samples following removal of a surface oxide by 1.0 M HCl etching. An increase in Raman spectra signal strength and a reduction of the apparent band-gap by up to 50 meV is observed. The thick surface oxide is believed to have formed as a result of ex-situ exposure of the samples on removal from the growth system. The importance of target nitridation for RF sputtered material is also demonstrated.
Original language | English |
---|---|
Pages (from-to) | 373-376 |
Number of pages | 4 |
Journal | Physica Status Solidi C: Conferences |
Issue number | 1 |
DOIs | |
Publication status | Published - 2002 |