Wavelength-selective patterning of multi-layered electronic devices

James Downes (Inventor), Christopher McMahon (Inventor)

Research output: Patent

Abstract

A method is disclosed for manufacturing a layered photo-patterned electronic device. The method includes the steps of providing a first layer of precursor material and depositing a second layer of precursor material onto the first layer to at least partially cover the first layer. The method further includes the steps of selectively photo-patterning the second layer using electro-magnetic (EM) radiation (light) of a compatible wavelength band, wherein the first layer is substantially not photo-patternable or photosensitive to the EM radiation of a compatible wavelength band. A multi-layered stack that is at least partially photo-patternable to provide at least a portion of an electronic device is also disclosed.

Original languageEnglish
Patent numberWO2017096429
IPCH01L 21/00,G03F 7/095
Priority date11/12/15
Filing date9/12/16
Publication statusSubmitted - 15 Jun 2017

Bibliographical note

Designated States:
AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)

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