Abstract
A method is disclosed for manufacturing a layered photo-patterned electronic device. The method includes the steps of providing a first layer of precursor material and depositing a second layer of precursor material onto the first layer to at least partially cover the first layer. The method further includes the steps of selectively photo-patterning the second layer using electro-magnetic (EM) radiation (light) of a compatible wavelength band, wherein the first layer is substantially not photo-patternable or photosensitive to the EM radiation of a compatible wavelength band. A multi-layered stack that is at least partially photo-patternable to provide at least a portion of an electronic device is also disclosed.
Original language | English |
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Patent number | WO2017096429 |
IPC | H01L 21/00,G03F 7/095 |
Priority date | 11/12/15 |
Filing date | 9/12/16 |
Publication status | Submitted - 15 Jun 2017 |
Bibliographical note
Designated States:AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)