X-ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films

Sunil Kumar*, K. S. A. Butcher, T. L. Tansley

*Corresponding author for this work

Research output: Contribution to journalArticle

56 Citations (Scopus)

Abstract

Carbon nitride thin films prepared by radio frequency reactive sputtering of graphite in pure nitrogen plasma have been characterized by x-ray photoelectron spectroscopy (XPS) for probing the chemical bonding in the films. The multiple binding energy values obtained for the C 1s and N 1s photoelectrons in the film suggest that both the C and N atoms exhibit at least three types of chemical states, manifestative of different types of the C-N bonding present in the material. The presence of theoretically predicted β-C3N4 phase in our C-N films has been suggested on the basis of XPS and optical data.

Original languageEnglish
Pages (from-to)2687-2692
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume14
Issue number5
DOIs
Publication statusPublished - Sep 1996

Fingerprint Dive into the research topics of 'X-ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films'. Together they form a unique fingerprint.

Cite this