X-ray photoelectron spectroscopy depth profiling of aluminium nitride thin films

Engineering & Materials Science

• Depth profiling 100%
• Aluminum nitride 86%
• X ray photoelectron spectroscopy 74%
• Hydrolysis 73%
• Argon 68%
• Thin films 57%
• Ions 56%
• Ultrahigh vacuum 47%
• Angle measurement 37%
• Nitrogen 28%
• Oxygen 24%
• Silicon 23%
• Carbon 23%
• Substrates 21%
• Temperature 12%

Physics & Astronomy

• hydrolysis 69%
• aluminum nitrides 69%
• depletion 53%
• photoelectron spectroscopy 50%
• argon 47%
• thin films 31%
• ultrahigh vacuum 30%
• ions 28%
• x rays 27%
• chambers 24%
• nitrogen 22%
• valence 22%
• carbon 20%
• conduction 20%
• oxygen 18%
• room temperature 16%
• silicon 16%

Chemistry

• Aluminium Nitride 82%
• Depth Profiling 76%
• X-Ray Photoelectron Spectroscopy 42%
• Hydrolysis 37%
• Valence Band 33%
• Vacuum 24%
• Ion 24%
• Surface 19%
• Nitrogen 18%
• Ambient Reaction Temperature 16%
• Dioxygen 14%
• Carbon Atom 14%